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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Imaging parameter optimization for advanced lithography based on STELLA
Pforr, Rainer, Mader, Leonhard, Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240921
File:
PDF, 520 KB
english, 1996