![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Micromachining and Microfabrication '96 - Austin, TX (Monday 14 October 1996)] Microlithography and Metrology in Micromachining II - Multiexposure capability development for deep x-ray lithography for MEMS
Khan Malek, Chantal G., Postek, Jr., Michael T., Friedrich, Craig R., Wood, Robert L., Dudley, Bruce W., Ling, Zhong G., Saile, VolkerVolume:
2880
Year:
1996
Language:
english
DOI:
10.1117/12.250947
File:
PDF, 1.13 MB
english, 1996