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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA, USA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Role of photoacid structure on the performance of 193-nm resists
Allen, Robert D., Tarascon-Auriol, Regine G., Opitz, Juliann, Larson, Carl E., Di Pietro, Richard A., Breyta, Gregory, Hofer, Donald C.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275811
File:
PDF, 724 KB
english, 1997