SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA, USA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Design and process of a new DUV ARCH3 resist
Bantu, N. R., Tarascon-Auriol, Regine G., Maxwell, Brian, Medina, Arturo N., Sarubbi, Thomas R., Toukhy, Medhat A., Schacht, Hans-Thomas, Falcigno, Pasquale A., Muenzel, Norbert, Petschel, Klaus, HoulVolume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275833
File:
PDF, 768 KB
english, 1997