SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA, USA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - New approach to PEB mechanisms in novolac-DNQ resists: influence of physical and viscoelastic properties
Toublan, Olivier, Tarascon-Auriol, Regine G., Peloso, Helene, Prola, Alain, Paniez, Patrick J.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275835
File:
PDF, 334 KB
english, 1997