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SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III - Statistical multilot characterization of spatial thickness variations in LPCVD oxide, nitride, polysilicon, and thermal oxide films
Carlen, Edwin T., Keshavarzi, Ali, Prasad, Sharad, Mastrangelo, Carlos H., Hartmann, Hans-DieterVolume:
3216
Year:
1997
Language:
english
DOI:
10.1117/12.284705
File:
PDF, 519 KB
english, 1997