SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Approach to CD-SEM metrology utilizing the full waveform signal
McIntosh, John M., Singh, Bhanwar, Kane, Brittin C., Bindell, Jeffery B., Vartuli, Catherine B.Volume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308759
File:
PDF, 3.58 MB
english, 1998