SPIE Proceedings [SPIE Optoelectronics and High-Power Lasers & Applications - San Jose, CA (Saturday 24 January 1998)] Laser Applications in Microelectronic and Optoelectronic Manufacturing III - Low-fluence laser-assisted chemical etching of InP: an XPS study
Moffitt, Christopher E., Dubowski, Jan J., Dyer, Peter E., Wrobel, Jerzy M., Wieliczka, David M., Dubowski, Jan J., Fraser, Jeffrey W.Volume:
3274
Year:
1998
Language:
english
DOI:
10.1117/12.309502
File:
PDF, 1.72 MB
english, 1998