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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Dynamic characterization of step-induced vibrations of x-ray mask membranes
Schlax, Michael P., Vladimirsky, Yuli, Engelstad, Roxann L., Lovell, Edward G.Volume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309626
File:
PDF, 1.16 MB
english, 1998