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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Optical Microlithography XI - Application of substructuring method to three-dimensional optical lithography simulation
Lee, Seung-Gol, Van den Hove, Luc, Seo, Choong-Ki, Lee, Dong-Hoon, Lee, Jong-Ung, Cho, MeangHyo S.Volume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310812
File:
PDF, 695 KB
english, 1998