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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - MOSCASEL: a total solution to electron-beam lithography simulation
Cui, Zheng, Vladimirsky, YuliVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351122
File:
PDF, 2.36 MB
english, 1999