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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - ZrSiO: a new and robust material for attenuated phase-shift mask in ArF lithography
Onodera, Toshio, Abboud, Frank E., Grenon, Brian J., Matsuo, Takahiro, Nakazawa, Keisuke, Miyazaki, Junji, Ogawa, Tohru, Morimoto, Hiroaki, Haraguchi, Takashi, Fukuhara, Nobuhiko, Matsuo, Tadashi, OtaVolume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373329
File:
PDF, 449 KB
english, 1999