SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Comparison study of mask error effects for various mask-making processes
Eom, Tae-Seung, Abboud, Frank E., Grenon, Brian J., Hur, Ikboum, Koo, Youngmo, Baik, Ki-Ho, Choi, Il-Hyun, Kim, Do Yun, Shin, ChulVolume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373369
File:
PDF, 1.73 MB
english, 1999