SPIE Proceedings [SPIE Photomask Technology and Management...

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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - CD error sensitivity to "sub-killer" defects at k 1 near 0.4: II

Nakagawa, Kent H., Abboud, Frank E., Grenon, Brian J., Chen, J. Fung, Socha, Robert J., Dusa, Mircea V., Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Van Den Broeke, Douglas J.
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Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373382
File:
PDF, 1.25 MB
english, 1999
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