SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
Sooriyakumaran, Ratnam, Houlihan, Francis M., Fenzel-Alexander, Debra, Brock, Phillip J., Larson, Carl E., Di Pietro, Richard A., Wallraff, Gregory M., Hofer, Donald C., Dawson, Dan J., Mahorowala, ArVolume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388282
File:
PDF, 1.54 MB
english, 2000