SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Reaction mechanisms in silicon-based resist materials: polysilanes for deep-UV, EUV, and x-ray lithography
Seki, Shu, Houlihan, Francis M., Sakurai, Yusuke, Maeda, Kazuki, Kunimi, Yoshihisa, Nagahara, Seiji, Tagawa, SeiichiVolume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388326
File:
PDF, 316 KB
english, 2000