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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - SiON as a panacea for KrF photolithography? Study on process optimization, substrate dependency, and delay time stability on silicon nitride and BPTEOS film
Chun, Jun-Sung, Houlihan, Francis M., Bakshi, Shekhar, Barnett, Stanley, Shih, James, Lee, Shih-KedVolume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388356
File:
PDF, 1.15 MB
english, 2000