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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Thick-film positive DUV photoresist for implant layer application
Mori, J. Michael, Houlihan, Francis M., Thackeray, James W., Xu, Cheng-Bai, Orsula, George W., Prettyman, Elizabeth, Bell, Rosemary, Routh, Robert M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388371
File:
PDF, 2.17 MB
english, 2000