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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation
Chabala, Jan M., Weaver, Suzanne, Alexander, David W., Pearce-Percy, Henry T., Lu, Maiying, Cole, Damon M., Abboud, Frank E., Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390067
File:
PDF, 3.90 MB
english, 2000