SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - High-contrast i-line positive photoresist for laser reticle writer
Kobayashi, Yoshihito, Morimoto, Hiroaki, Oppata, Y., Ezoe, Y., Shigemitsu, Fumiaki, Urayama, K., Doi, K.Volume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392066
File:
PDF, 866 KB
english, 2000