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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - 150-nm DR contact holes die-to-database inspection
Kuo, Shen C., Morimoto, Hiroaki, Wu, Clare, Eran, Yair, Staud, Wolfgang, Hemar, Shirley, Lindman, OferVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392072
File:
PDF, 3.46 MB
english, 2000