SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Increasing degree of homogeneity of electrical parameters of neutron-transmuted silicon
Makhkamov, Shermakhmat, Burnett, David, Kimura, Shin'ichiro, Tursunov, Nigmatilla A., Ashurov, Maripjon, Singh, Bhanwar, Khakimov, Zokirkhon M.Volume:
4181
Year:
2000
Language:
english
DOI:
10.1117/12.395740
File:
PDF, 85 KB
english, 2000