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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Minimization of mask transmission asymmetry effect for chromeless phase-shift masks
Chan, David Y., Grenon, Brian J., Dao, Giang T., Novak, Justin W., Fritze, MichaelVolume:
4186
Year:
2000
Language:
english
DOI:
10.1117/12.410678
File:
PDF, 1.27 MB
english, 2000