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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools
Stenkamp, Dirk, Kienzle, O., Orchowski, Alexander, Rau, Wigbert D., Weickenmeier, A., Benner, G., Wetzke, M., Waskiewicz, Warren K., Katsap, Victor, Zhu, Xieqing, Liu, Haoning, Munro, Eric, Rouse, JohVolume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436642
File:
PDF, 542 KB
english, 2001