SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - First performance data obtained on next-generation optical mask metrology tools
Roeth, Klaus-Dieter, Kawahira, Hiroichi, Blaesing-Bangert, Carola, Alt, Herger, Schlueter, Gerhard W.Volume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438331
File:
PDF, 712 KB
english, 2001