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SPIE Proceedings [SPIE International Symposium on Microelectronics and MEMS - Adelaide, Australia (Monday 17 December 2001)] Device and Process Technologies for MEMS and Microelectronics II - Submicron high-aspect-ratio silicon beam etch
Chiao, Jung-Chih, O'Brien, Gary, Monk, David J., Faraone, Lorenzo, Harrison, H. Barry, Najafi, Khalil, Shkel, Andrei M.Volume:
4592
Year:
2001
Language:
english
DOI:
10.1117/12.448983
File:
PDF, 1.39 MB
english, 2001