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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Simulation study of reticle enhancement technology applications for 157-nm lithography
Schurz, Dan L., Dao, Giang T., Grenon, Brian J., Flack, Warren W., Karklin, LinardVolume:
4562
Year:
2001
Language:
english
DOI:
10.1117/12.458255
File:
PDF, 491 KB
english, 2001