![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Optimization of ArF alternating phase-shifting mask structure for 100-nm node and inspection of phase defects
Chiba, Kazuaki, Dao, Giang T., Grenon, Brian J., Takahashi, Hiroyuki, Nozaki, Wataru, Akima, Shinji, Nagashige, Susumu, Yamada, YoshiroVolume:
4562
Year:
2001
DOI:
10.1117/12.458319
File:
PDF, 295 KB
2001