SPIE Proceedings [SPIE Design, Process Integration, and Characterization for Microelectronics - Santa Clara, CA (Wednesday 6 March 2002)] Design, Process Integration, and Characterization for Microelectronics - Symmetry enhancement method for process modeling and its applications in IC design and OPC
Lei, Junjiang, Sanie, Michael, Lay, David K., Starikov, Alexander, Tobin, Jr., Kenneth W.Volume:
4692
Year:
2002
Language:
english
DOI:
10.1117/12.475681
File:
PDF, 75 KB
english, 2002