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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Mix and match capability of e-beam direct-write for the 65-nm technology
Engelstad, Roxann L., Laplanche, Yves, Charpin, Murielle, Pain, Laurent, Todeschini, J., Henry, Daniel, Sassoulas, Pierre-Olivier, Gough, S., Weidenmueller, Ulf, Hahmann, PeterVolume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.482342
File:
PDF, 278 KB
english, 2003