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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Contact hole inspection by real-time optical CD metrology
Opsal, Jon L., Herr, Daniel J., Chu, Hanyou, Wen, Youxian, Li, Guangwei, Chang, Yia-ChungVolume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.487607
File:
PDF, 430 KB
english, 2003