SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Defect printability and inspection capability for tri-tone PSM
Nagamura, Yoshikazu, Tanabe, Hiroyoshi, Maetoko, Kazuyuki, Maeshima, Kiyoshi, Tamada, Naohisa, Hosono, Kunihiro, Fujimoto, Masaya, Kodera, Yutaka, Goto, Koji, Narita, Tsuyoshi, Matsuo, Fuyuhiko, AkimaVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504207
File:
PDF, 455 KB
english, 2003