SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Transparent corner enhancement scheme for a DUV pattern generator
Martinsson, Hans, Tanabe, Hiroyoshi, Hellgren, Jonas, Eriksson, Niklas, Bjuggren, Mans, Sandstrom, TorVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504276
File:
PDF, 234 KB
english, 2003