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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device
Lee, Ju-Hyung, Tanabe, Hiroyoshi, Kim, Hyung-Do, Chung, Dong-Hoon, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-SungVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504280
File:
PDF, 1.84 MB
english, 2003