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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Conversion from 50 KeV to DUV mask writer for 90-nm technology critical layers
Hong, Dongsung, Smith, Bruce W., Krishnan, Prakash, Coburn, Dianna, Zawadzki, Mary, Yang, Yonghong, Green, Kent, Buck, Peter, Jackson, Curt A., Martinez, LarryVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.535882
File:
PDF, 898 KB
english, 2004