SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography
Ke, Chih-Ming, Silver, Richard M., Hung, Hsueh-Liang, Chang, Anderson, Chen, Jeng-Horng, Gau, Tsai-Sheng, Ku, Yao-Ching, Lin, Burn J., Otaka, Tadashi, Ueda, Kazuhiro, Kawada, Hiroki, Nomura, Hiroaki,Volume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.536147
File:
PDF, 676 KB
english, 2004