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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - OCD study of critical dimension and line-shape control of shallow-trench-isolation structures
Feng, Ye, Silver, Richard M., Zhang, Xiaodong, Cheung, Beverly, Liu, Zhuan, Isao, Mita, Hayashi, ManabuVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.536582
File:
PDF, 996 KB
english, 2004