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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Data Analysis and Modeling for Process Control - Automated fault detection and classification of etch systems using modular neural networks
Hong, Sang J., Tobin, Jr., Kenneth W., May, Gary S., Yamartino, John, Skumanich, AndrewVolume:
5378
Year:
2004
Language:
english
DOI:
10.1117/12.536870
File:
PDF, 1.60 MB
english, 2004