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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis
Sendelbach, Matthew, Silver, Richard M., Archie, Charles N., Banke, Bill, Mayer, Jason, Nii, Hideaki, Herrera, Pedro, Hankinson, MattVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.538009
File:
PDF, 180 KB
english, 2004