SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Reticle CD-SEM for 65-nm technology node and beyond
Schlueter, Gerhard W. B., Staud, Wolfgang, Weed, J. Tracy, Nakamura, Takayuki, Matsumoto, Jun, Seyama, Masahiro, Whittey, John M.Volume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.568270
File:
PDF, 481 KB
english, 2004