SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - EUVL mask patterning with blanks from commercial suppliers
Yan, Pei-Yang, Staud, Wolfgang, Weed, J. Tracy, Zhang, Guojing, Nagpal, Rajesh, Shu, Emily Y., Li, Chaoyang, Qu, Ping, Chen, Frederick T.Volume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569329
File:
PDF, 334 KB
english, 2004