SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Design of PACs for high-performance photoresists (I): role of di-esterified PACs having hindered -OH groups
Hanawa, Ryotaro, Novembre, Anthony E., Uetani, Yasunori, Hanabata, MakotoVolume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59733
File:
PDF, 302 KB
english, 1992