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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Robust lithography process control methodology anticipating CD after etching using scatterometry below 65nm node
Kaneguchi, Tokihisa, Smith, Bruce W., Someya, Atsushi, Kawahira, HiroichiVolume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.598574
File:
PDF, 299 KB
english, 2005