![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - OPC accuracy enhancement through systematic OPC calibration and verification methodology for sub-100nm node
Yang, Hyunjo, Silver, Richard M., Choi, Jaeseung, Cho, Byungug, Cho, Byeongho, Yim, Donggyu, Kim, JinwoongVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.599728
File:
PDF, 206 KB
english, 2005