SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Comparison of scatterometry, atomic force microscope, dual beam system, and XSEM to measure etched via depths
Sendelbach, Matthew, Silver, Richard M., Shneyder, Dmitriy, Lu, Wei, Boyd, KevinVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.600737
File:
PDF, 337 KB
english, 2005