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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - An investigation of a new generation of progressive mask defects on the pattern side of advanced photomasks
Bhattacharyya, Kaustuve, Silver, Richard M., Eickhoff, Mark, Grenon, Brian, Ma, Mark, Pas, SylviaVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.601010
File:
PDF, 730 KB
english, 2005