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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Exploring new high speed mask aware RET verification flows
Martin, Patrick, Komuro, Masanori, Progler, Christopher J., Ham, Young-mog, Kasprowicz, Bryan, Gray, Rick, Wiley, James N., Yu, Zongchang, Ye, JunVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617366
File:
PDF, 426 KB
english, 2005