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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - A novel approach for full-chip SRAF printability check
Hung, Chi-Yuan, Flagello, Donis G., Zhang, Liguo, Liu, QingweiVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.654113
File:
PDF, 363 KB
english, 2006