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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Improved profile measurement accuracy via feed-forward spectroscopic ellipsometry
Peters, Robert M., Archie, Chas N., Lakkapragada, SureshVolume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656447
File:
PDF, 373 KB
english, 2006