SPIE Proceedings [SPIE SPIE 31st International Symposium on...

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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - High transmission mask technology for 45nm node imaging

Conley, Will, Flagello, Donis G., Morgana, Nicoló, Kasprowicz, Bryan S., Cangemi, Mike, Lassiter, Matt, Litt, Lloyd C., Cangemi, Marc, Cottle, Rand, Wu, Wei, Cobb, Jonathan, Ham, Young-Mog, Lucas, Kev
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Volume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.659353
File:
PDF, 601 KB
english, 2006
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